Delivery and installation of a ICP Reactive ion etcher for silicon dielctrics
- Buyer
- Danmarks Tekniske Universitet - DTU, Kgs. Lyngby
- Country
- Denmark
- Estimated value
- —
- Deadline
- 23 Nov 2026, 23:55 CET
- Published
- 12 Oct 2026
- Procedure
- Open procedure
- Contract type
- Supplies
Categories
From the original notice
DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for oxides and nitrides of silicon to become its new primary instrument for 150 mm wafer processing. Delivery is expected no later than Q3 2027. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools. It serves a diverse community of over 200 active users, ranging from novice students to experienced researchers, as well a high percentage of commercial clients. As an open access tool, the Instrument must support the full…
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Only the original notice and the buyer's documents are legally binding.