Deep Reaction Ion Etcher (DRIE)
- Buyer
- Uppsala universitet, Uppsala
- Country
- Sweden
- Estimated value
- SEK 1
- Deadline
- 10 Nov 2026, 00:00 CET
- Published
- 8 Oct 2026
- Procedure
- Open procedure
- Contract type
- Supplies
Categories
- 42000000 Industrial machinery
From the original notice
Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The…
Only the original notice and the buyer's documents are legally binding.